Large Area Full Fill Factor Microlens Arrays

Production of microlens arrays using the resist reflow technique has been extensively reported1,2. Theses arrays have fill factors approaching 75% and in lensed systems the unlensed light introduces noise into the imaging system. N T Gordon, C L Jones and D Purdy3 reported a sophisticated techniques able to create full fill, however, this is expensive. Davies and McCormick4, using optical lithography, proposed an alternative method for photosculpting full fill factor arrays. Using large area arrays in afocal combinations obviates the need for good spherical or chromatic aberration compensation. However, when the arrays are employed as single layer devices in image decoding elements, high quality lenses are required. The microengineering of corrected microlens arrays, using optical lithography and standard laboratory replication techniques will be illustrated.